A spin-on photosensitive polymeric etch protection mask for anisotropic wet etching of siliconDALVI-MALHOTRA, J; ZHONG, X. F; PLANJE, C et al.Journal of micromechanics and microengineering (Print). 2008, Vol 18, Num 2, issn 0960-1317, 025029.1-025029.8Article

Photosensitive Etch Protection Coating for Silicon Wet-Etch ApplicationsDALVI-MALHOTRA, J; ZHONG, X. F; PLANJE, C et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 68840J.1-68840J.8, issn 0277-786X, isbn 978-0-8194-7059-1Conference Paper